Laboratories and equipment on Experimental Physics

Thin film technology is used in wide range areas like electronic and optoelectronic devices, energy harvesting (photovoltaic devices), energy storage (batteries) and coating material for drug delivery applications. A fundamental step in thin film deposition is controlled synthesis of material during the deposition process to achieve a uniform thin film. Atomic Layer Deposition (ALD) is a technique that allows the growth of thin films, in atomic scale from a few tens of nanometer (a single layer of atoms or molecules) up to micrometer (several layer of atoms or molecules), layer by layer. The ALD system at Experimental Physics in LTU, Savannah 200 from Ultratech/Cambridge Nanotech, operates in continuous mode and exposure mode. The continuous mode enables to deposit a thin film that is uniform, conformal and perfectly dense rapidly. In the exposure mode, we are able to coat high aspect ratio materials like porous materials, fibers and nanogels. There is possibility to grow different types of films like oxides (Al2O3, Co3O4, TiO2, SiO2, ZnO, ZrO2, In2O3, SnO2, Ga2O3, MoO3, V2O3), doped oxides (AZO, ATO, ITO), Nitrides (Zr3N4, AlN, TiN), and sulfide (ZnS).

The CRM-200 system includes a single stage spectrometer with an IR-enhanced CCD and an APD, a system of notch filters and photonic crystal-based fiber optics.

Available excitation lasers:

1. Spectra physics Millenia V, 532 nm, 5 W max output power
2. Coherent, 633 nm, 30 mW max output power

Our IR spectroscopy equipment consists of:

• Vertex 70v vacuum-based FTIR spectrometer for measurements in mid- and near-IR range.
• Hyperion 2000 IR microscope with ATR attachments and long-working distance objectives.
• FT-Raman module and microscope with 1064 nm excitation laser (1000 mW).